公开了一种CMOS图像传感器及其制造方法，其中在活性区与场效应区之间的边界未被离子注入损坏。
A CMOS image sensor and a method for fabricating the same are disclosed, in which the boundary between an active region and a field region is not damaged by ion implantation.
公开了一种CMOS图像传感器及其制造方法，其中在活性区与场效应区之间的边界未被离子注入损坏。
A CMOS image sensor and a method for fabricating the same are disclosed, in which the boundary between an active region and a field region is not damaged by ion implantation.
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