涂层的化学气相沉积(CVD)和表面层改性的物理气相沉积(PVD)涂层的离子注入，所有三个正在受到考验，并部分使用。
Coating by physical vapour deposition (PVD), coating by chemical vapour deposition (CVD) and surface layer modification by ion implantation, all three are being tested and are partly in use.
薄膜的制备方法包含很多，主要有化学气相沉积，物理气相沉积和其他一些独特的制备方法。
There are a lot of methods in producing films, including CVD, PVD and some other special methods.
含有金属材料的构件，物理气相沉积靶，薄膜，和形成金属构件的方法。
Components comprising metallic material, physical vapor deposition targets, thin films, and methods of forming metallic components.
与其它物理气相沉积技术也作了定性和定量的比较。
Quantitative and qualitative comparisons are carried out with other physical vapour deposition techniques.
陶瓷薄膜的制备技术多种多样，如物理气相沉积、化学气相沉积、高温烧结和“溶胶-凝胶”法等。
There are many techniques for fabricating ceramic films such as PVD, CVD, high-temperature sintering and sol-gel method.
陶瓷薄膜的制备技术多种多样，如物理气相沉积、化学气相沉积、高温烧结和“溶胶-凝胶”法等。
There are many techniques for fabricating ceramic films such as PVD, CVD, high-temperature sintering and sol-gel method.
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