提供了一种以提高的台阶覆盖率高温沉积非晶碳膜的方法。
Methods for high temperature deposition an amorphous carbon film with improved step coverage are provided.
这种薄膜具有很小的压应力,很低的针孔密度,良好的台阶覆盖性等优点。
The films have advantages of slightly compressive stress, very low pin-hole density and superior step coverage.
衬底温度决定原子的表面迁移率,衬底温度是影响淀积的铝膜的均匀性和台阶覆盖能力的主要因素。
Therefore, the substrate temperature was the main factor which obviously affected the atoms distribution and step coverage of Al thin films.
最后结合SEM下的台阶覆盖情况和接触孔电阻值,确定了通过对基准接触孔形貌进行物理轰击倒角的最优方法。
In conclusion, by step coverage under SEM and contact resistance, find the best method of physical bombing filleting on the baseline contact shape.
最后结合SEM下的台阶覆盖情况和接触孔电阻值,确定了通过对基准接触孔形貌进行物理轰击倒角的最优方法。
In conclusion, by step coverage under SEM and contact resistance, find the best method of physical bombing filleting on the baseline contact shape.
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