结合激光外差干涉术和反射式椭偏测量技术，设计了一种抗干扰能力强，快速、高精度测量纳米厚度薄膜光学参数的方法。
Optical heterodyne interferometry together with reflective ellipsometry, a fast measurement technology with high anti-interference performance was applied to nanometer film.
结合激光外差干涉术和反射式椭偏测量技术，设计了一种抗干扰能力强，快速、高精度测量纳米厚度薄膜光学参数的方法。
Optical heterodyne interferometry together with reflective ellipsometry, a fast measurement technology with high anti-interference performance was applied to nanometer film.
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