化学气相沉积法是最可行的方法。
评述了金刚石薄膜的化学气相沉积方法。
The methods of preparing diamond films by chemical vapor deposition were reviewed.
本文介绍了一种新的化学气相沉积碳化钛方法。
The present article introduces a new technique of chemical vapour deposition titanium Carbide.
采用热丝化学气相沉积生长出优异的金刚石薄膜。
High quality diamond thin films were grown by hot-filament chemical vapor deposition.
讨论了化学气相沉积金刚石薄膜的各种衬底材料。
In this paper, substrate materials of diamond films by chemical vapor deposition are discussed.
所用的碳纳米管是用热灯丝化学气相沉积法合成的。
Carbon nanotubes in experiments were synthesized by hot filament chemical vapor deposition.
研究所用的碳纳米管是用热灯丝化学气相沉积法合成的。
The carbon nanotubes were synthesized by the heat filament chemical vapor deposition.
实验中所用碳纳米管由化学气相沉积法(CVD)合成。
The carbon nanotubes were synthesized by the heat filament chemical vapor deposition (CVD).
本文报道了CO_2激光化学气相沉积非晶硅的实验研究。
Experimental results on amorphous silicon growth by CO2 laser chemical vapor deposition are reported.
采用化学气相沉积(cvd)法，制备出大量的高性能碳微球。
In this paper, a great deal of high property carbon microspheres were prepared by CVD method.
评述了化学气相沉积金刚石薄膜衬底表面预处理技术的进展情况。
The progress of pretreatment techniques of substrate surface for CVD diamond film was reviewed.
以镍为催化剂，利用微波等离子体化学气相沉积法制备了弹簧状碳纤维。
Under the catalytic effect of nickel particles, spring-like carbon filaments were synthesized through microwave plasma chemical vapor deposition.
为快速沉积高品质金刚石膜，建立了热阴极等离子体化学气相沉积方法。
Hot cathode chemical vapor deposition method was established in order to deposit high-quality diamond films with high deposition rate.
本文针对电浆辅助化学气相沉积在太阳能产业上的应用作一概略性的介绍。
This paper gives an overview of plasma enhanced chemical vapor deposition used in the solar industry.
减少反应器内部的自由空间，是提高流场品质和化学气相沉积效果的关键。
It is key to improve the chemical vapor infiltration quality that reducing the free-space in the CVI reactor.
采用甚高频等离子体增强化学气相沉积技术制备了不同衬底温度的微晶硅薄膜。
A series of microcrystalline silicon thin films were fabricated by very high frequency plasma-enhanced chemical vapor deposition at different substrate temperatures (T_s).
本文介绍了化学气相沉积制膜技术在国民经济各个领域中的应用及其发展趋势。
The article has introduced the application and development tendency of techniques of film making with chemical vapor deposition in all fields.
采用热丝化学气相沉积法(HFCVD)在普通玻璃衬底上低温沉积多晶硅薄膜。
Polycrystalline silicon thin films were prepared by hot-filament chemical vapor deposition (HFCVD) on glass at low-temperatures.
课堂讲授和实验课重点介绍了基本制程技术，如扩散、氧化、光刻、化学气相沉积等。
Lectures and laboratory sessions focus on basic processing techniques such as diffusion, oxidation, photolithography, chemical vapor deposition, and more.
在热丝化学气相沉积金刚石系统中，衬底温度是影响金刚石成膜质量的关键因素之一。
In HFCVD system the substrate temperature is a key factor which deeply affects the quality of diamond films.
本文系统研究了石英钟罩式微波等离子体辅助化学气相沉积装置对沉积金刚石薄膜的影响。
In this paper diamond films were deposited using bell-jar type microwave plasma assisted CVD system.
薄膜的制备方法包含很多，主要有化学气相沉积，物理气相沉积和其他一些独特的制备方法。
There are a lot of methods in producing films, including CVD, PVD and some other special methods.
利用微波等离子体化学气相沉积(CVD)设备，在硅基片上进行了金刚石薄膜的沉积实验。
The experiment of the deposition of diamond thin films is made on silicon substrate by using microwave plasma chemical vapor deposition (CVD) system.
直流热阴极辉光放电等离子体化学气相沉积法是我们建立的快速沉积高品质金刚石膜的新方法。
Direct current hot cathode plasma glow discharge chemical vapor deposition (DC-HCPCVD) is a new method to deposit high quality diamond films with high growth rate.
大电流热阴极辉光放电用于等离子体化学气相沉积金刚石膜，有效地提高了沉积速率和膜品质。
Large current hot cathode glow discharge was used for plasma chemical vapor deposition of diamond films. It improved deposition rate and films quality efficiently.
纳米碳管自1991年被发现以来，目前主要的制备方法有电弧法和化学气相沉积(cvd)法。
Since carbon nanotubes (CNTs) have been discovered in 1991, they are mainly produced by arc-discharge evaporation and Chemical vapor Deposition (CVD) method.
探讨如何用电子回旋共振化学气相沉积(ECRCVD)设备制备非晶态氮化硅介质膜和光学膜。
This article is about how to use Electron Cyclotron Resonance Chemical Vapor Deposition (ECRCVD) method to prepare amorphous silicon nitride (SiN_x) film.
因为没有一个公司能使化学气相沉积过程完美应用，AMAT在尝试他们自己的流程，使用各种方法和材料。
Since no company has perfected the chemical vapor deposition process, Applied materials is testing out their process using a variety of methods and materials.
介绍了等离子体化学工艺，特别着重介绍了溅射镀膜与等离子体化学气相沉积在粉末冶金中的应用。
This article introduces processing of plasma chemistry and application of sputter coating and plasma-enhanced chemical vapor deposition in powder metallurgy especially.
介绍了等离子体化学工艺，特别着重介绍了溅射镀膜与等离子体化学气相沉积在粉末冶金中的应用。
This article introduces processing of plasma chemistry and application of sputter coating and plasma-enhanced chemical vapor deposition in powder metallurgy especially.
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