化学气相沉积法是最可行的方法。
化学镀法、化学气相沉积法及溶胶凝胶法等。
Fabrication methods often include electroless plating, chemical vapor deposition, and sol gel technique, etc.
所用的碳纳米管是用热灯丝化学气相沉积法合成的。
Carbon nanotubes in experiments were synthesized by hot filament chemical vapor deposition.
研究所用的碳纳米管是用热灯丝化学气相沉积法合成的。
The carbon nanotubes were synthesized by the heat filament chemical vapor deposition.
实验中所用碳纳米管由化学气相沉积法(CVD)合成。
The carbon nanotubes were synthesized by the heat filament chemical vapor deposition (CVD).
如电化学气相沉积法、等离子喷涂法、溶胶-凝胶法等。
Therefore, some membrane-forming technologies have been developed to prepare the electrolyte membranes, for example, electrochemical vapor deposition (EVD), plasma spraying, sol-gel etc.
在较佳具体实施例中，该共沉积作用系以等离子体强化化学气相沉积法进行。
In a preferred embodiment, the codeposition is carried out by plasma enhanced chemical vapor deposition.
采用热丝化学气相沉积法(HFCVD)在普通玻璃衬底上低温沉积多晶硅薄膜。
Polycrystalline silicon thin films were prepared by hot-filament chemical vapor deposition (HFCVD) on glass at low-temperatures.
以镍片为基板材料，利用微波等离子体化学气相沉积法在低温条件下合成了纳米碳管膜。
Carbon nanotube films were synthesized on Ni substrate by microwave plasma chemical vapor deposition at low temperature.
采用固体三氧化二硼，用热丝辅助化学气相沉积法在石墨衬底上沉积了掺硼金刚石涂层。
B-doped diamond films were grown on graphite substrates by hot filament assisted CVD method (HFCVD).
多晶硅薄膜的制备方法很多，主要有化学气相沉积法、激光结晶法、金属诱导晶化法等。
Poly-Si can be produced by laser crystallization of a-Si, metal-induced crystallization of a-Si, and many other methods.
采用固体三氧化二硼，用热丝辅助化学气相沉积法在石墨衬底上沉积了掺硼金刚石涂层。
B-doped diamond films were grown on graphite substrates by hot filament assisted CVD method (HFCVD). The dopant was solid B_2O_3.
首先采用溶胶-凝胶法制备镍催化剂，在此基础上用化学气相沉积法高产率地制备了碳纳米管。
The catalyst was first produced by sol-gel method and the carbon nanotubes were high yield synthesized by the catalytic chemical vapor decomposition method.
直流热阴极辉光放电等离子体化学气相沉积法是我们建立的快速沉积高品质金刚石膜的新方法。
Direct current hot cathode plasma glow discharge chemical vapor deposition (DC-HCPCVD) is a new method to deposit high quality diamond films with high growth rate.
采用射频等离子体增强化学气相沉积法(RF - PECVD)在钢衬底上沉积氮化硅薄膜。
Silicon nitride thin films were prepared onto steel substrates by radio-frequency plasma enhanced chemical vapor deposition (RF-PECVD) technique.
之后，利用氨气等离子体促进化学气相沉积法对上述经电镀制程而形成的电镀金属层进行退火处理。
Finally, annealing process is carried out in the electroplated metal layer formed by the electroplating process through chemical vapor deposition method under promotion of ammonia plasma.
采用热丝化学气相沉积法在覆盖c _(60)膜的硅基片上沉积金刚石膜，研究了金刚石膜的成核与生长。
In this paper, the diamond films were grown on the C_ (60) -coated silicon substrate by using hot-filament chemical vapor deposition technique. The diamond nucleation and growth were studied.
研究结果表明：用射频等离子体增强化学气相沉积法，可以在PET上沉积厚度为纳米至微米级的非晶碳氢膜。
The results show: the amorphous hydrogenated carbon film can be fabricated on PET surface by plasma-enhanced chemical vapor deposition.
目前主要采用化学气相沉积法、离子束溅射法、激光等离子体沉积和激光烧蚀、离子镀、离子注入法等制备方法。
Its structure and character were reviewed, and the synthetic methods, including CVD, ion beam sputtering, laser ablation, ion plating and ion irradiation et al., were completely introduced.
为了对颗粒表面进行改性，在自行设计组装的流化床反应器中，利用化学气相沉积法(CVD)制备了不同的复合颗粒。
In order to modify the surface properties of the particles, composite particles are prepared by the process of Chemical Vapor Deposition (CVD) in a fluidized bed reactor.
本文利用热灯丝化学气相沉积法(HFCVD)制备了纳米量级的碳薄膜材料，对它的电学性质及场发射性质进行了详细的研究。
In this dissertation, extensive researches on the electrical and field emission properties of nano-carbon films prepared by hot filament chemical vapor deposition (HFCVD).
金属有机化学气相沉积法(MOCVD)是一种先进的涂层制备方法，采用此方法制备的涂层具有质量高、完整性好、厚度易于控制等优点。
(MOCVD) is an advanced preparative technique. Coatings prepared by the method have many strongpoints such as high quality, good completeness and good controllability.
本工作利用热丝化学气相沉积(HFCVD)法获得了(100)取向不同质量的金刚石薄膜，并制备了CVD金刚石辐射探测器。
In present work, (100) oriented CVD diamond films with different quality obtained by a hot-filament chemical vapor deposition (HFCVD) technique were used to fabricate radiation detectors.
纳米碳管自1991年被发现以来，目前主要的制备方法有电弧法和化学气相沉积(cvd)法。
Since carbon nanotubes (CNTs) have been discovered in 1991, they are mainly produced by arc-discharge evaporation and Chemical vapor Deposition (CVD) method.
近年来，化学气相沉积(CVD)法逐渐应用于车针后续处理过程之中，增强了车针的耐磨性和切削效率。
Recently, chemical vapor deposition (CVD) is gradually used in order to enhance the wear resistance and cutting efficiency of bures.
陶瓷薄膜的制备技术多种多样，如物理气相沉积、化学气相沉积、高温烧结和“溶胶-凝胶”法等。
There are many techniques for fabricating ceramic films such as PVD, CVD, high-temperature sintering and sol-gel method.
多种工艺可以用来制备透明导电薄膜，如磁控溅射真空反应蒸发、化学气相沉积、溶胶-凝胶法以及脉冲激光沉积等。
Many processes are used to prepare transparent conductive films, such as magnetron sputtering, vacuum reactive evaporation, chemical vapor depositions, Sol-gel, laser-pulsed deposition.
从简化步骤、降低成本的角度出发，采用快速热化学气相沉积（RTCVD）法在低纯颗粒带硅（SSP）衬底上制备出了多晶硅薄膜太阳电池。
Polycrystalline silicon thin film solar cell by RTCVD on SSP substrate is prepared so as to simplify the process and lower the cost.
采用化学气相沉积(cvd)法，制备出大量的高性能碳微球。
In this paper, a great deal of high property carbon microspheres were prepared by CVD method.
采用化学气相沉积(cvd)法，制备出大量的高性能碳微球。
In this paper, a great deal of high property carbon microspheres were prepared by CVD method.
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