本发明公开了一种化学机械抛光液，其含有溶胶型二氧化硅、速率增助剂、表面活性剂和水。
The invention discloses chemi-mechanical polishing liquid, which comprises a sol type silicon dioxide, a velocity accelerating auxiliary agent, a surfactant and water.
本发明公开了一种化学机械抛光液，其含有溶胶型二氧化硅、速率增助剂、表面活性剂和水。
The invention discloses chemi-mechanical polishing liquid, which comprises a sol type silicon dioxide, a velocity accelerating auxiliary agent, a surfactant and water.
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