一种复合式化学机械抛光法，是先在第一抛光机台中，以第一抛光盘 对待平坦层进行初步的抛光。
The invention is a combined chemical-mechanical polishing method, firstly primarily polishing a to-be-flattened layer by first polishing disc in the first polisher platform;
一种复合式化学机械抛光法，是先在第一抛光机台中，以第一抛光盘 对待平坦层进行初步的抛光。
The invention is a combined chemical-mechanical polishing method, firstly primarily polishing a to-be-flattened layer by first polishing disc in the first polisher platform;
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