• 剂中的材料具有一定刻蚀速率

    More often , all of the materials etchant have a finite etch rate.

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  • 衬底预处理采用化学刻蚀高温处理

    Chemical etching and high temperature heating were used for pretreatment of substrates.

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  • 分析了检测结果刻蚀机理

    The detected results and etching mechanisms are analysed.

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  • 制作采用传统光刻刻蚀工艺

    The sensor is fabricated by traditional lithography and etching.

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  • 田纳西刻蚀伯兰高原东部边缘。

    The Tennessee River sculpts the east side of the Cumberland Plateau.

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  • 简单介绍了ICP刻蚀系统刻蚀原理

    The ICP etching system and principle were introduced.

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  • 随着气体流量增加刻蚀速度不断降低

    With the increase of flow of the gas, the etching rate decreases continually.

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  • 刻蚀工艺分辨率图形转移保真量度

    The resolution of an etching process is a measure of the fidelity of pattern transfer.

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  • 刻蚀工艺分辨率图形转移保真量度

    The resolution of an etching process is a measure of the fidelity of pattern transfer .

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  • 介绍一种新的亚微米发射极窗口刻蚀工艺

    This paper introduces a novel submicron etching technology for emitter window.

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  • 更精细刻蚀技术可以孕育更高性能的微芯片,仅仅开始

    Finer etching begets higher-performing microchips, and that's just a start.

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  • 装置具有结构简单损伤各向异性刻蚀优点。

    It has advantages of sample structure, low damage and anisotropic etching.

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  • 并且详细论述离子刻蚀原理以及离子参数设计

    The theory of ion etching and the parameter of ion source designing are discussed in detail.

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  • 电子束刻蚀晶片上纳米级形成了电感器。

    Inductors were defined by electron-beam lithography and formed by depositing micron-thick aluminium metal onto the wafers.

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  • 当能刻蚀材料不存在时,这些物种就具有长的寿命

    The species has a long lifetime in the absence of etchable material .

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  • 通常所有暴露刻蚀剂中的材料都具有一定的刻蚀速率

    More often, all of the materials exposed to the etchant have a finite etch rate.

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  • 等离子体低温刻蚀一种针对高深宽结构的干法刻蚀技术。

    High aspect ratio structures have been successfully fabricated by plasma cryo-etching on silicon wafers.

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  • 难熔金属贵金属组合薄膜使刻蚀成为一个艰巨任务

    The combination of refractory and noble metals in a single layer makes etching a formidable task.

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  • 大多数湖泊山谷U形,是上一个冰河时代冰川刻蚀的结果

    Most of the lakes lie in U-shaped valleys that were carved by glaciers during the last ice age.

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  • 本文以金属刻蚀去胶为背景,简述干刻清洗工艺开发评价过程。

    Based on ash chamber of metal etch this paper describes the full process of dry clean development and evaluation.

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  • 然后等离子体中用电子束刻蚀去除沟道石墨烯形成晶体管沟道

    They then defined the transistor channel using electron-beam lithography, removing graphene outside of channel regions with an oxygen plasma.

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  • 研究还发现,不同垫层(塑料片铝板导热性能刻蚀速率影响很小

    Meanwhile, the difference in thermal conductivity of underlining materials (plastic sheet, steel sheet and aluminium plate) has little effect on the etching rate.

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  • 通过反应离子刻蚀可以将光刻胶微透镜图形转移这种高性能的聚合物材料上。

    Pattern transfer technique is used to transfer photoresist microlens arrays into the polymer underlayer.

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  • 该系统检测了仅用CF4作为刻蚀气体刻蚀非晶薄膜等离子体发射

    The optical emission spectrum of r. f. plasma during amorphous silicon based film etching in CF4 gas is detected.

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  • 文章综述扫描探针刻蚀技术最新研究进展,介绍了扫描探针刻蚀加工机理

    This paper summarized the current development of scanning probe lithography and introduced the mechanisms of forming nanometer structure.

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  • 电池片表面划伤,但对于制作过程中采用激光刻蚀工艺电池的边沿刻蚀线除外

    No scratch allowed, with exception of laser scratched lines for the cells fabricated with laser for edge isolation.

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  • 目前刻蚀技术已经成为集成电路生产中的标准技术,干法刻蚀设备亦成为关键设备。

    Now etching has be-come the standard technology, and etching equipment is the key equipment in IC production.

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  • 针对刻蚀入射能量增加而下降的问题,详细研究了刻蚀羽辉刻蚀过程中的影响

    It is found that etching rate decreases with increasing incident fluences, so the influence of plume in the etching process is studied.

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  • 分析了真空压力射频功率气体组合及其流量电极温度刻蚀速率刻蚀剖面影响

    The dependence of etching rate and profile on the vacuum pressure, RF pow-er, gas composition and flow rate, and electrode temperature is analyzed.

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  • 缺陷接地结构近年提出种在微波平面电路接地版刻蚀出非周期形状的结构。

    Defected ground structure (DGS) is a nonperiodic structure proposed in recent years, which means machining various shapes of etching on the ground plane.

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