另外，尼康光刻机业务也开始扭亏为盈。
光刻-从掩膜到圆片转移的过程。
Lithography % - The process used to transfer patterns onto wafers.
球面像差能破坏光刻的成像质量。
Spherical aberration can damage image quality in photolithography.
与项目研发组、光刻组密切合作。
因而是对量子光刻术的一个很大改进。
制作采用的是传统的光刻、刻蚀工艺。
The sensor is fabricated by traditional lithography and etching.
同时还介绍了电子束光刻技术及其改进。
The electron beam lithography and its improvement are introduced also.
激光刻录不需要工艺图纸，减少登记出错。
The laser process does not require artwork, reducing misregistration issues.
本文综述了深亚微米光刻和纳米光刻技术。
In this article, deep submicron lithography and nano processing are reviewed.
本文介绍了同步辐射光刻镜扫描控制系统。
In this paper a scanning mirror control system is introduced.
激光刻录不需要工艺图纸，减少登记出错。
The laser process does not require artwork , reducing misregistration issues.
对准方法，对准基底，光刻装置和器件制造方法。
Aligning method, aligning substrate, photoetching device and component manufacturing method.
光刻装置，镜元件，器件制造方法，及束传送系统。
Photoetching device, mirror element, device producing method and beam transfering system.
讨论了采用浸液式光刻获得的成像结果和套刻结果。
In this paper we discuss the results on imaging and overlay obtained with immersion.
采用新型的多层抗蚀剂结构的电子束光刻来形成图形。
Electron - beam lithography with a novel multilevel resist structure defines the pattern.
因而，该技术也是目前国际上先进光刻领域研究的热点。
Therefore, the technology of EUVL is becoming a hot point in international lithography field.
阐述高分辨力光刻机的图像对准系统的原理及实现过程。
The principle and implementation of high precision video based alignment system are described.
这位分析师还表示：“尼康在LCD光刻机市场上仍保持强势地位。
应用于立体光刻技术的耐久性，白色，防水和低收缩的树脂。
Durable, white, water - resistant, low shrinkage resin for stereo lithography for SLA system.
氧化物、掩模或标线的不透明区域，或光刻层中不需要的小孔。
A small undesired hole in an oxide opaque region of a mask or reticle or in a photoresist layer.
在进行大规模集成电路光刻时，采用同步辐射光源是一项新技术。
It is an new technology to use synchrotron radiation lithograph for making large scale integral circuit.
利用SU-8光刻胶制备电铸模和微电铸工艺，制造了二维微执行器原型。
The prototype of the micro actuator is fabricated by means of micro electroforming and SU-8 photolithography techniques.
校准光刻装置的方法，对准方法，计算机程序，光刻装置和器件制造方法。
A method of calibrating a lithographic apparatus, an alignment method, a computer program, a lithographic apparatus and a device manufacturing method.
由此可分割LSI单元图形成最少曝光单元，以提高曝光效率和版图光刻质量。
Bye formula and the algorithm, we can partition a graph of LSI element into a group of minimum exposure element, to advance exposure efficiency and lithophotography quality.
一般认为，驻波效应对薄胶的光刻图形有较大的影响，而对厚胶的光刻图形影响不大。
It is accepted that standing wave does more effect on the lithography patterns of thin resist, whereas less of thick resist.
随着光学光刻极限分辨率的不断提高，当代光学光刻设备正面临着越来越严重的挑战。
With the continuous improvement of optical lithography limit resolution, the current lithography tool is facing with more and more serious challenge.
初步研究了SU-8胶的光刻工艺流程，讨论了涂胶、前烘等各个步骤对光刻结果的影响。
The process of SU-8 photoresist lithography is researched, and the influence of steps like coating and soft-bake on the lithography is studied.
本文重点讨论了曲面光刻的关键技术——自动调焦系统，并对曲面工艺及光刻线条进行实验分析。
The study of this dissertation analyses the focus system technology, which is the key technology of curve plane surface lithographic fabrication techniques.
不过他表示闪存业者会使用液浸式光刻机制造位密度在64 - 128gbit的闪存芯片产品。
However, he did say chip makers expect to ship 64 and 128 Gbit flash devices using immersion tools.
传统光学光刻技术的高成本促使科学家去开发新的非光学方法，以取代集成电路工厂目前所用的工艺。
The high cost in traditional optics lithography drives the scientists to invent new non-optical methods to replace processes currently used in IC factories.
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