本发明公开了制造图像传感器的方法,该方法包括以下步骤:在其中形成有光电二极管的衬底上方形成层间介电层;
The invention discloses a method for manufacturing an image sensor. The method comprises following steps: forming an interlayer dielectric layer above a substrate where a photodiode is formed;
本发明公开了制造图像传感器的方法,该方法包括以下步骤:在其中形成有光电二极管的衬底上方形成层间介电层;
The invention discloses a method for manufacturing an image sensor. The method comprises following steps: forming an interlayer dielectric layer above a substrate where a photodiode is formed;
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