评述了金刚石薄膜的化学气相沉积方法。
The methods of preparing diamond films by chemical vapor deposition were reviewed.
薄膜厚度的均匀性是影响沉积方法应用的一个重要因素。
The thickness uniformity of the films is one of the important factors affecting the application of deposition methods.
介绍了两种普遍采用的类金刚石（DLC）膜沉积方法。
Two commonly adoptived depositing methods of diamond-like-carbon(DLC) are introduced and analyzed.
危害说悬浮沉积方法可能会被限制为树脂，在可预见的未来。
Harms says the suspended deposition method will probably be limited to resins for the foreseeable future.
利用热灯丝化学气相沉积方法在光滑的钼上沉积了金刚石膜。
The diamond films deposited on polished molybdenum by hot filament chemical vapor deposition (HFCVD) were investigated by scanning electron microscopy (SEM) and Raman spectroscopy.
他设计的悬浮沉积方法尚未实现商业化，通过这可能在未来发生。
The suspended deposition method he devised has yet to be commercialized, though that could happen in the future.
采用过滤阴极电弧沉积方法有可能制成无宏观粒子的类金刚石薄膜。
It is possible to deposit DLC (Diamond-Like Carbon) without MP by filtered vacuum arc deposition.
为快速沉积高品质金刚石膜，建立了热阴极等离子体化学气相沉积方法。
Hot cathode chemical vapor deposition method was established in order to deposit high-quality diamond films with high deposition rate.
采用镍的无电子化学沉积方法研究了纳米二氧化钛粉末表面的快速金属化。
Quick surface metallization of titania powder was carried out by electroless chemical deposition of nickel.
通过金属有机物化学气相沉积方法在碳纳米管模板上生长氮化镓纳米线束。
Template growth of gallium nitride nanowires was demonstrated by metal organic chemical vapor deposition (MOCVD) with carbon nanotubes as templates in this paper.
型半导体氧化锌薄膜，其制备方法，和使用透明基片的脉冲激光沉积方法。
P-type semiconductor zinc oxide films, process for preparation thereof, and pulsed laser deposition method using transparent substrates.
就电沉积方法制备软磁铁箔时要实现连续化生产的一些关键技术进行讨论。
Key technique of electrodepositing to produce iron foil during the process of continuous production was discussed.
结果表明： 通过化学沉积方法， 金属镍可在活化点沉积并形成包覆层；
The results show that Ni coatings can be deposited and formed on the surface of carbon nanotubes.
研究了一种通过电解沉积方法在防锈铝lf21表面上生成铈盐转化膜的工艺。
Cerium-based conversion coating was successfully deposited on corrosion-resisting aluminium alloy LF21 in cerium containing solution using electrolysis method.
本发明涉及扩散薄膜的沉积方法和装置，用于半导体制造和各种工其的表面涂覆中。
This invention relates to a method and apparatus for deposition of a diffused thin film, useful in the fabrication of semiconductors and for the surface coating of various tools.
介绍了制备纳米镀层的电沉积方法，主要有直流电沉积、脉冲电沉积和复合共沉积。
The electrodepositing method for the preparation of nano-deposit was introduced, including direct current electrodeposition, pulse electrodeposition and composite electrodeposition.
本发明描述将一个或多个无机层置放于释放层(诸如多孔、微粒释放层)上的沉积方法。
Deposition approaches are described to place one or more inorganic layers onto a release layer, such as a porous, particulate release layer.
就所有CVD金刚石沉积方法而言，原子态氢的形成发生在沉积区域附近一选择区域内。
In the case of all CVD diamond deposition methods the formation of atomic hydrogen occurs in a selected volume near the deposition area.
以磁控溅射沉积方法，采用循环氩离子轰击镀和未循环轰击镀工艺在金属铀上制备了铝薄膜。
Aluminum film on uranium is prepared using magnetron sputtering with and without circulated argon ion bombardment process.
本文研究了用热灯丝化学气相沉积方法在单晶硅衬底上制备金刚石薄膜时其成核密度与制备条件的关系。
In the present paper, the relation between diamond nucleation density and synthesis conditions is studied for the diamond thin film synthesized by hot filament chemical vapour deposition method.
以烧结B4C为靶材料、在氮离子束辅助下用脉冲激光沉积方法制备了三元化合物硼碳氮(BCN)薄膜。
Using sintered B4C as target material, ternary BCN thin films were synthesized by means of pulsed laser deposition assisted by nitrogen ion beam.
在非铁磁性磨粒的分步沉积方法的研究中，主要是通过实验来验证分步沉积法从理论到实际应用中的可行性。
In the research on the method of fractional precipitation, we mainly verify the possibility from theories to physically by experiment.
用氢气、丙酮蒸汽为源气体，通过微波增强的化学气相沉积方法，实现了在金刚石表面气相外延生长单晶金刚石薄膜。
Vapour epitaxial grown single-crystal diamond film on diamond surface was obtained by microwave reinforced chemical vapour deposition method, using hydrogen, aceton vapour as source of gas.
利用微波等离子体化学气相沉积方法，以H 2、CH4和八甲基环四硅氧烷(D4)为原料，在硬质合金基体上沉积了金刚石涂层。
Diamond coatings were deposited on cemented carbide substrates with H2, CH4 and D4 as precursors by using microwave plasma chemical vapor deposition technique.
由于这些优点，可以通过辐射测量方法以足够确定沉积证据的年代，从而建立一个精确的冰河时代年表。
Because of these advantages, sedimentary evidence can be dated with sufficient accuracy by radiometric methods to establish a precise chronology of the ice ages.
科学家们通过一种名为“原子层沉积”的化学方法在普通的蜘蛛丝上镀上锌原子、钛原子或者铝原子。
The scientists used a process called atomic layer deposition to coat some spider silk with zinc, titanium or aluminum.
因为没有一个公司能使化学气相沉积过程完美应用，AMAT在尝试他们自己的流程，使用各种方法和材料。
Since no company has perfected the chemical vapor deposition process, Applied materials is testing out their process using a variety of methods and materials.
这表明，轨道(遥感)探测(比如“亥伯龙号”)的方法可以用来探测木卫二非冰沉积物的化学成分，并可能从中发现地外微生物等生命迹象。
This means that an orbiting sensor like Hyperion could be used to identify chemicals in Europa's non-ice deposits that may be a sign of extraterrestrial microbial life.
它的方法是通过借鉴于碟片储存行业的“喷溅”处理来沉积CIGS层面。
Its approach is to deposit the CIGS layer using a sputtering process borrowed from the disk-storage industry.
它的方法是通过借鉴于碟片储存行业的“喷溅”处理来沉积CIGS层面。
Its approach is to deposit the CIGS layer using a sputtering process borrowed from the disk-storage industry.
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